Chaoliang Tan

Dr. Chaoliang Tan is an Assistant Professor in the Department of Electrical Engineering at City University of Hong Kong, China. His current research is focusing on 2D materials and devices, biomaterials and intercalation chemistry. He has authored or co-authored over 130 SCI papers.

More than 40 of them are first author or corresponding author papers, including Nat. Nanotechnol., Nat. Rev. Mater., Chem. Rev., Chem. Soc. Rev., Nat. Commun., J. Am. Chem. Soc., Angew. Chem. Int. Ed., Adv. Mater., ACS Nano and Small. The total citation of his published papers is over 18,900 with a H-index of 59. He has been listed as the “Highly Cited Researcher” (Top 1%, Clarivate Analytics) in last four years (2018-2021) as well as “Top 2% Scientists in the world” in Engineering by Stanford University in last two years (2020-2021). He also received the NSFC Excellent Young Scientist Fund (HK & Macau) in 2021. For more information, please visit his homepage: https://www.tan-lab-cityu-hk.com/ opens in new tab/window